SK hynix announced the assembly of the industry´s first high na euv lithography system for mass production at the M16 fabrication plant in Icheon, South Korea. The company held an event to commemorate the installation attended by SK hynix´s head of R&D Cha Seon Yong and head of manufacturing technology Lee Byoungki, along with ASML´s head of customer team SK hynix-Japan Kim Byeong-Chan. The assembled equipment is intended to support production of next-generation dram.
According to SK hynix, the introduction of the high na euv system lays the foundation for quicker development and supply of cutting-edge products amid intense global semiconductor competition. The company framed the move as part of efforts to enhance credibility and stability of the global supply chain through close collaboration with business partners. The announcement emphasizes the strategic role of process technology in scaling memory cells to improve productivity and product performance.
SK hynix highlighted that more sophisticated patterning enabled by the high na euv process can increase the number of chips produced from a single wafer and improve power efficiency and overall performance. The company presented the assembly as a mass-production-capable step rather than a research milestone, positioning the equipment at the M16 facility to advance manufacturing capability for its next-generation dram products. No additional technical specifications, timelines for ramping to volume production, or commercial product names were provided in the article.
